Presentatie van de kenmerken van de apparatuur
GSTMS series magnetron sputtering coating equipment is a single-body sputtering coating machine. Multiple molecular pumps provide excellent vacuum conditions and stable sputtering conditions.
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GSTMS series magnetron sputtering coating equipment is a single-piece sputtering coating machine. Multiple molecular pumps provide excellent vacuum conditions and stable sputtering conditions.
Equipment features:
Cavity size φ1200-φ2000mm;
Use anode layer ion source/gridless RF ICP system;
Fully automatic coating process is achieved through ACS fully automatic coating control system;
The workpiece rack is a multi-piece rack type/planetary structure;
The oil-free exhaust system can be customized;
The film forming process and status can be observed from multiple angles;
| Item | Specificatie |
| Vacuum Chamber Size | SUS304 φ1920mm×1700mm(H) |
| Work Rack | Multi-piece hanging assembly structure |
| Work Rack Dimensions | φ1800×1150 |
| Substrate Rotation Speed | 3r/min~30r/min (variable) |
| Reaction Rate Control Mode | Reaction rate control Speedlo / Direct reaction |
| Target Source | Rotary/planar cathodes, mid-frequency/DC, 2–6 pairs |
| Target Source Control | Crystal control / Cumulative time control |
| Ion Source | Anode layer ion source / RF-ICP |
| Vacuum Pumping | Mechanical pump + Turbo pump / Cryopump / Cryogenic trap pump |
| Item | Specificatie |
| Ultimate Vacuum | 2.5×10⁻⁴Pa |
| Pumping Time | From atmosphere to 4.0×10⁻³Pa in 15 minutes at room temperature with no load |
| Substrate Temperature | Maximum 350°C |
| Item | Specificatie |
| Space Requirements | Approx. 5.1m (W) × 5.6m (D) × 3m (H) |
| Power Requirements | Three-phase, five-wire, 380V, 50Hz, approx. 80kW |
| Cooling Water Requirements | 160L/min, 0.2–0.3MPa, 10–35°C |
| Compressed Air | 0.6MPa |
| Equipment Weight | Approx. 14000kg |
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