Peralatan mesin pelapis sputtering magnetron GSTMS-1800

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Presentasi karakteristik peralatan

GSTMS series magnetron sputtering coating equipment is a single-body sputtering coating machine. Multiple molecular pumps provide excellent vacuum conditions and stable sputtering conditions.

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Peralatan mesin pelapis sputtering magnetron GSTMS-1800

GSTMS series magnetron sputtering coating equipment is a single-piece sputtering coating machine. Multiple molecular pumps provide excellent vacuum conditions and stable sputtering conditions.

Equipment features:
Cavity size φ1200-φ2000mm;
Use anode layer ion source/gridless RF ICP system;
Fully automatic coating process is achieved through ACS fully automatic coating control system;
The workpiece rack is a multi-piece rack type/planetary structure;
The oil-free exhaust system can be customized;
The film forming process and status can be observed from multiple angles;

ItemSpesifikasi
Vacuum Chamber SizeSUS304 φ1920mm×1700mm(H)
Work RackMulti-piece hanging assembly structure
Work Rack Dimensionsφ1800×1150
Substrate Rotation Speed3r/min~30r/min (variable)
Reaction Rate Control ModeReaction rate control Speedlo / Direct reaction
Target SourceRotary/planar cathodes, mid-frequency/DC, 2–6 pairs
Target Source ControlCrystal control / Cumulative time control
Ion SourceAnode layer ion source / RF-ICP
Vacuum PumpingMechanical pump + Turbo pump / Cryopump / Cryogenic trap pump
GSTMS-1800 Main Specifications
ItemSpesifikasi
Vakum Utama2.5×10⁻⁴Pa
Pumping TimeFrom atmosphere to 4.0×10⁻³Pa in 15 minutes at room temperature with no load
Substrate TemperatureMaximum 350°C
Basic Performance
ItemSpesifikasi
Space RequirementsApprox. 5.1m (W) × 5.6m (D) × 3m (H)
Persyaratan DayaThree-phase, five-wire, 380V, 50Hz, approx. 80kW
Cooling Water Requirements160L/min, 0.2–0.3MPa, 10–35°C
Compressed Air0.6MPa
Berat PeralatanApprox. 14000kg
Operating Conditions

Peralatan mesin pelapis sputtering magnetron GSTMS-1800