Thiết bị máy phún xạ magnetron GSTMS-1400

Bắt đầu

Giới thiệu các đặc tính của thiết bị

GSTMS-1400 magnetron sputtering coating machine is a single-body sputtering coating machine. Multiple molecular pumps provide excellent vacuum conditions and stable sputtering conditions.

mẫu đã qua xử lý
Thiết bị máy phún xạ magnetron GSTMS-1400

GSTMS series magnetron sputtering coating equipment is a single-piece sputtering coating machine. Multiple molecular pumps provide excellent vacuum conditions and stable sputtering conditions.

Equipment features:
Cavity size φ1200-φ2000mm;
Use anode layer ion source/gridless RF ICP system;
Fully automatic coating process is achieved through ACS fully automatic coating control system;
The workpiece rack is a multi-piece rack type/planetary structure;
The oil-free exhaust system can be customized;
The film forming process and status can be observed from multiple angles;

GSTMS-1400 Main Specifications:

Mặt hàngThông số kỹ thuật
Vacuum Chamber SizeSUS304 φ1650mm×1400mm(H)
Work RackMulti-piece hanging assembly structure
Work Rack Dimensionsφ1350×500
Substrate Rotation Speed3r/min~30r/min (variable)
Reaction Rate Control ModeReaction rate control Speedlo / Direct reaction
Target SourceRotary/planar cathodes, mid-frequency/DC (2–5 pairs)
Target Source ControlCrystal control / Cumulative time control
Ion SourceAnode layer ion source / RF-ICP
Vacuum PumpingMechanical pump + Turbo pump / Cryopump / Cryogenic trap pump

Basic Performance:

Mặt hàngThông số kỹ thuật
Ultimate Vacuum2.5×10⁻⁴ Pa
Pumping TimeFrom atmosphere to 4.0×10⁻³ Pa in 15 minutes at room temperature with no load
Substrate TemperatureMaximum 150°C

Operating Conditions:

Mặt hàngThông số kỹ thuật
Space RequirementsApprox. 5m (W) × 4m (D) × 2.8m (H)
Power Requirements3-phase, 5-wire, 380V, 50Hz, approx. 60kW
Cooling Water Requirements120L/min, 0.2–0.3MPa, 10–35°C
Compressed Air0.6MPa
Trọng lượng thiết bịApprox. 7000kg
Thiết bị máy phún xạ magnetron GSTMS-1400