عرض خصائص المعدات
GSTMS-1400 magnetron sputtering coating machine is a single-body sputtering coating machine. Multiple molecular pumps provide excellent vacuum conditions and stable sputtering conditions.
العينات المعالجة
GSTMS series magnetron sputtering coating equipment is a single-piece sputtering coating machine. Multiple molecular pumps provide excellent vacuum conditions and stable sputtering conditions.
Equipment features:
Cavity size φ1200-φ2000mm;
Use anode layer ion source/gridless RF ICP system;
Fully automatic coating process is achieved through ACS fully automatic coating control system;
The workpiece rack is a multi-piece rack type/planetary structure;
The oil-free exhaust system can be customized;
The film forming process and status can be observed from multiple angles;
GSTMS-1400 Main Specifications:
| غرض | مواصفة |
| Vacuum Chamber Size | SUS304 φ1650mm×1400mm(H) |
| Work Rack | Multi-piece hanging assembly structure |
| Work Rack Dimensions | φ1350×500 |
| Substrate Rotation Speed | 3r/min~30r/min (variable) |
| Reaction Rate Control Mode | Reaction rate control Speedlo / Direct reaction |
| Target Source | Rotary/planar cathodes, mid-frequency/DC (2–5 pairs) |
| Target Source Control | Crystal control / Cumulative time control |
| Ion Source | Anode layer ion source / RF-ICP |
| Vacuum Pumping | Mechanical pump + Turbo pump / Cryopump / Cryogenic trap pump |
Basic Performance:
| غرض | مواصفة |
| Ultimate Vacuum | 2.5×10⁻⁴ Pa |
| Pumping Time | From atmosphere to 4.0×10⁻³ Pa in 15 minutes at room temperature with no load |
| Substrate Temperature | Maximum 150°C |
Operating Conditions:
| غرض | مواصفة |
| Space Requirements | Approx. 5m (W) × 4m (D) × 2.8m (H) |
| Power Requirements | 3-phase, 5-wire, 380V, 50Hz, approx. 60kW |
| Cooling Water Requirements | 120L/min, 0.2–0.3MPa, 10–35°C |
| الهواء المضغوط | 0.6MPa |
| Equipment Weight | Approx. 7000kg |
المنتجات ذات الصلة
إتقان التقنيات الأساسية في التصنيع الإضافي للمعادن عالية الأداء ومعالجة الأسطح












