Technical features of horizontal chemical vapor deposition CVD furnace equipment (SiC, BN)
1. Using advanced control technology, the flow and pressure of MTS can be precisely controlled, the deposition gas flow in the furnace is stable, and the pressure fluctuation range is small;
2. Fully enclosed deposition chamber, good sealing effect, strong anti-pollution ability;
3. Multi-channel process gas path, uniform flow field, no deposition dead corner, good deposition effect;
4. Multi-stage high-efficiency exhaust gas treatment system, which can effectively treat highly corrosive exhaust gas, flammable and explosive gas, solid dust and low melting point viscous products, is environmentally friendly;
5. Optional newly designed anti-corrosion vacuum unit, long continuous working time, extremely low maintenance rate;
Used process atmosphere: vacuum/CH4/H2/N2/Ar/BCI3/NH3/MTS.

Configuration options for horizontal chemical vapor deposition furnaces (SiC, BN)
Structural form: horizontal – single door/double door; vertical – upper discharge/lower discharge
Door locking method: manual/automatic
Shell material: inner layer stainless steel/all stainless steel
Insulation material: carbon felt/graphite felt/carbon fiber cured felt/ceramic fiber felt
Heater, muffle material: graphite/CFC/metal
Thermocouple: K/N/C/S graduation number
Vacuum pump: mechanical pump set/corrosion-resistant pump set