The vacuum high-temperature CVD furnace uses high-temperature chemical vapor deposition to deposit various thin films on the surface of the workpiece. It is widely used in the semiconductor industry and aerospace thermal barrier coatings, including the deposition of large-area insulating materials, as well as most metal materials and metal alloy materials, such as tantalum carbide coatings and silicon carbide coating materials.
For example, tantalum carbide coatings and silicon carbide coatings can be deposited on the surface of graphite workpieces.
It is suitable for production enterprises and material laboratories of major universities, scientific research institutes, environmental science and other fields.
Equipment composition
The furnace shell is made of stainless steel, with a double-layer water-cooled structure, and is equipped with an observation window, an infrared temperature measurement window, and a thermocouple temperature measurement device.
Heating system
A heater is installed inside the equipment to form a thermal field for thin film deposition.
Sample stage system
The sample stage can mount several workpieces at the same time.
Temperature measurement and heating power supply
1. Thermocouples/tungsten-rhenium thermocouples/infrared thermometers are used for temperature control and detection.
2. The power of the heating power supply is customized according to actual requirements.