High vacuum resistance thermal evaporation coating machine (PVD coating equipment) adopts resistance thermal evaporation technology. It deposits various compounds, mixtures, single layers or multilayer films on the substrate by heating the material under high vacuum conditions. It can be used for production and scientific experiments, and can be customized according to user requirements; it can be used for physical and chemical research of materials; it can be used to prepare metal conductive electrodes; it can be used for physical and chemical performance research experiments of organic materials, principle research experiments of organic semiconductor devices, OLED experimental research and organic solar thin film battery research experiments, etc.

Equipment composition
– Single coating chamber
– Single coating chamber + sample feeding chamber
– Single coating chamber + glove box (coating chamber can be placed in glove box)
– Single coating chamber + sample feeding chamber + glove box (coating chamber can be placed in glove box)
– Multiple coating chambers + sample transfer chamber + glove box (forming a cluster structure, sample transfer uses vacuum manipulator)

Equipment composition
Resistive thermal evaporation source assembly, sample mask baffle system, vacuum acquisition system and vacuum measurement system, molecular pump (or cold pump) vacuum unit, rotating substrate heating table, working gas circuit, glove box connection parts, sample transfer mechanism, film thickness control system, electronic control system, constant temperature cooling water system, etc.
The type and quantity of thermal evaporation sources can be configured according to user needs.
Optional: film thickness monitor, constant temperature cooling water tank.

Thermal evaporation source types and configurations
Resistance thermal evaporation source components: Quantity: 1 to 12 sets (can be equipped according to user requirements);
Resistance thermal evaporation source types: Tantalum (tungsten or molybdenum) metal boat thermal evaporation source components, quartz boat thermal evaporation source components, tungsten electrode or tungsten blue thermal evaporation source components, tantalum furnace thermal evaporation source components (with boron nitride crucible or ceramic crucible), beam source furnace thermal evaporation components (with quartz crucible or boron nitride crucible).